CURRENT NEWS                                                                              

Stanford University places order for 2 CVD Systems with Plasma-Therm

July 28, 2010
The Versaline and Shuttlelock systems will give researchers at the Nanofabrication Facility the tools necessary to make advances in nanoscience applications.

StanfordUniversityhas recently placed an order for two Plasma-Therm deposition systems: a Versaline HDPCVD system and a Shuttlelock PECVD system. The tools will be installed at Stanford’s Nanofabrication F acility.

Plasma-Therm’s Versaline system, with its high density ICP plasma and temperature controlled environment, expands research capabilities by providing critical technology to deposit high quality dielectric films at low temperatures.

The Suttlelock PECVD system uses a more traditional configuration of parallel plate electrodes that contributes fundamental and important deposition processes such as controllable low stress silicon nitride. Together, the systems will be used to assist in the Nanofabrication Facility’s research efforts in areas such as nanoelectronic devices, MEMS/NEMS and photonics.

“Stanford University has long since established itself as a leading R&D facility. The deposition processes from industry proven systems like Versaline and Shuttlelock will give researchers at the Nanofabrication Facility the tools necessary to make advances in nanoscience applications,” commented Ed Ostan, Plasma-Therm’s EVP of sales & marketing.

“Plasma-Therm’s worldwide presence at nanofabrication facilities with processing equipment that spans decades is a reflection of equipment durability, reliability and technological relevance. Our continuous involvement and collaboration with these advanced laboratories is what stimulates process and equipment development”, he added.

The Stanford Nanofabrication Facility (SNF) serves academic, industrial and governmental researchers across the U.S. in areas ranging from optics, MEMS, biology, and chemistry, to traditional electronics device fabrication and process characterization.

 The SNF is a 10,000 sq.ft. class 100 cleanroom facility that provides researchers with effective and efficient access to advanced nanofabrication equipment and expertise. The SNF is one of 14 universities that make up the NSF’s National Nanotechnology Infrastructure Network (NNIN). NNIN is committed to providing nanofabrication resources to researchers across the country in both industry and academia.

Plasma-Therm, founded in 1974, is a supplier of advanced plasma process equipment offers etch and deposition technologies. Plasma-Therm systems support various specialty markets including solid state lighting and compound semiconductor.

 
NEWS
Compound Semiconductor. The most respected, authoritative and widely read information source connecting the community since 1995 To view the latest issue of Compound Semiconductor, click here
To register free of charge to receive news via e mail on a weekly basis click here.
Search the Compound Semiconductor web site
 
Submit your Lab & Fab article
It is imperative that CompoundSemiconductor.net remains a timely resource for this industry, so we are only interested in highlighting very recent work reported in academic papers.  Therefore, please only consider writing a short piece highlighting your work if you have a journal paper that has been accepted and about to appear in press, or a paper that has been published within the last month. For further guidelines, click here.
SHARE THIS
    Email this article to a friend
  Connotea       Cite-U-Like        Del.icio.us        Digg       

                                  

                           
 
FREE SUBSCRIPTION
CORPORATE PARTNERS






























































For maximum exposure, become a Corporate Partner.
Contact our sales team.
Buyer's Guide