The order was received, shortly after AIXTRON announced the launch of its next generation MOCVD systems AIX G5 HT and CRIUS® II. AIXTRON is very pleased with the success of these new system generations, having already received multiple purchase orders for tools of both technologies. 

Based on the proven Planetary Reactor® design, the AIX G5 HT features the largest wafer capacity available (56x2/14x4/8x6inch) in combination with revolutionary new reactor design features providing highest productivity and layer quality by allowing very high growth rates at high process pressures. The tool capabilities also include fully automated operation and advanced fab integration.

Dr. Rainer Beccard, Vice President Marketing at AIXTRON explains: “AIXTRON is committed to demonstrate its technological leadership. With the introduction of our new innovative technologies in our Next Generation Platform, the AIX G5 HT, we provide a revolutionary new reactor design to our customers that enables more than the doubling of productivity compared to the previous MOCVD generation.“

For further information on AIXTRON AG  please consult our website at: www.aixtron.com.